ST0982 Zirconium Sputtering Target

Descriptions of Zirconium Sputtering Targetzirconium-sputtering-targets

Zirconium sponge and crystal bars are the raw materials to make sputtering targets. Although zirconium sponge is cheap and has low purity, it contains a high oxygen content. Zirconium crystal bars have a higher cost and purity, making them ideal materials for sputtering targets. We provide two grades of high purity zirconium targets: low hafnium (250ppm, or 0.025%) and high hafnium.

Advanced Refractory Metals is a trusted supplier of zirconium sputtering targets. We provide a wide range of zirconium metal products with competitive price and great delivery time.

Specifications of Zirconium Sputtering Target

Material Zr crystal bar
Purity 99.95%
CAS Number 7440-67-7
Color Silver
Shape Diameter: 20~40mm


B 0.07 Ti 36 Mo 3.7
F 1.7 V 0.13 Rh <0>
Na 0.3 Cr 3.4 Pd <5>
Mg 0.09 Mn 0.2 In <0>
Al 48 Fe 51 Sn 16
Si 35 Co 0.032 Sb <0>
P 0.35 Ni 3.3 Te <0>
S 16 Cu 0.16 I <0>
Cl 1.6 Zn 0.28 La <0>
K 0.25 Br 0.039 Ce 0.021
Ca 0.33 Sr 0.009 Pr 0.036
Sc 0.6 Nb 1.7 Nd <0>
Ga 0.1 Ge <0> Sm <0>
As <0> Se <0> Ta 0.66
W 1.3 Re <0> Os <0>
Ir <0> Pt <0> Au <0>
Pb 0.96 Bi 0.28 U 1.1

*Contents of C, N, and O is not available

*Concentrations of other metal elements are too low to be determined.

Applications of Zirconium Sputtering Target

Zirconium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Packaging of Zirconium Sputtering Target

Our Zirconium sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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