Zirconium sponge and crystal bars are the raw materials to make sputtering targets. Although zirconium sponge is cheap and has low purity, it contains a high oxygen content. Zirconium crystal bars have a higher cost and purity, making them ideal materials for sputtering targets. We provide two grades of high purity zirconium targets: low hafnium (250ppm, or 0.025%) and high hafnium.
Advanced Refractory Metals is a trusted supplier of zirconium sputtering targets. We provide a wide range of zirconium metal products with competitive price and great delivery time.
|Material||Zr crystal bar|
*Contents of C, N, and O is not available
*Concentrations of other metal elements are too low to be determined.
Zirconium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Our Zirconium sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
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