ST1051 Tantalum Sputtering Target

Descriptions of Tantalum Sputtering Targettantalum-sputtering-target

Tantalum (Ta) Sputtering Targets are made from tantalum plate. Because tantalum has the ability to form thin oxides, and the resulting oxide film has a protective effect, tantalum is widely used as a base material for electrolyte capacitor manufacturing.

Advanced Refractory Metals is a global supplier of Tantalum Sputtering Targets and we can provide customized tantalum products. SAM's Tantalum Sputtering Targets is manufactured through Cold-Working Process, through forging, rolling, swaging, and drawing to get the desired size.

Specifications of Tantalum Sputtering Target

Part No. Material Size Purity
TA0201 Tantalum 1.00" Dia. x 0.125" Thick 99.95%
TA0202 Tantalum 1.00" Dia. x 0.250" Thick 99.95%
TA0203 Tantalum 2.00" Dia. x 0.125" Thick 99.95%
TA0204 Tantalum 2.00" Dia. x 0.250" Thick 99.95%
TA0205 Tantalum 3.00" Dia. x 0.250" Thick 99.95%
TA0206 Tantalum 3.00" Dia. x 0.250" Thick 99.95%
TA0207 Tantalum 4.00" Dia. x 0.250" Thick 99.95%
TA0208 Tantalum 4.00" Dia. x 0.250" Thick 99.95%
TA0209 Tantalum 5.00" Dia. x 0.250" Thick 99.95%
TA0210 Tantalum 5.00" Dia. x 0.250" Thick 99.95%

Applications of Tantalum Sputtering Target

* Used in a thermal inkjet printhead, can form the anti-cavitation film.
* Used in the integrated circuit with the base coating process to form a tantalum film which can prevent the diffusion of copper into the substrate silicon.
* Used in liquid crystal display (LCD), as well as heat, corrosion resistance, high conductivity, and other coating industries.

Packaging of Tantalum Sputtering Target

Our Tantalum (Ta) Sputtering Targets are carefully packed to prevent damage during storage & transportation.

Related Products of Tantalum Sputtering Target

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Refractory Metals and Alloys
Average rating:  
 1 reviews
by Donivan R. Porterfield on Refractory Metals and Alloys

As described in the description and very useful product.