Ion implantation is an important process in the manufacture of semiconductors. The most important part of an implanted system is the beam path. Here, the ions are generated, concentrated, accelerated, and targeted towards the wafer.
Our ion implantation components are made from molybdenum and tungsten due to these materials ideal combination of corrosion resistance, strength, and high thermal conductivity.
| Size | Manufactured per drawing |
|---|---|
| Material | Pure Mo |
| Purity | Mo≥99.95% |
* Used for Ion implantation process.
* Used to manufacture semiconductors.
* Used in metal finishing for tool steel toughening and surface finishing.
* Used in ion beam mixing to achieve graded interface and strengthen adhesion between immiscible material.
Our molybdenum ion implantation components are wrapped in foam and packaged in plywood cases to ensure safe storage and transportation.
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