High-Purity Tungsten Target for Semiconductor Chips The high-purity tungsten target is a typical chemical product of transition metal tungsten. Because of its high purity (greater than 99.95%), high density (19.35g/cm3), low vapor pressure, low evaporation rate, and high-temperature resistance, it is often used to produce ultra-small tungsten oxide films. As far as the current hot semiconductor […]
Tags: Advanced Refractory Metals, ARM, High-Purity Tungsten, How to make the tungsten target?, refractory alloys, Refractory Metal Tungsten, Refractory Metals, Tungsten, tungsten oxide, Tungsten Powder, Tungsten Target
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